The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2017
Filed:
Apr. 11, 2014
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Wintel Co., Ltd, Gyeonggi-do, KR;
Hong-Young Chang, Daejeon, KR;
Jin-Won Lee, Daejeon, KR;
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, Daejeon, KR;
Abstract
Provided are a plasma generating apparatus and a substrate processing apparatus. The plasma generating apparatus includes a plurality of dielectric tubes mounted in a plurality of through-holes formed in a vacuum container, respectively; antennas comprising or divided into a first group of antennas and a second group of antennas based on their disposition symmetry in the vacuum container and mounted outside the dielectric tubes, respectively; a first RF power source to supply power to the first group of antennas; a second RF power source to supply power to the second group of antennas; and a first power distribution unit disposed between the first group of antennas and the first RF power source to distribute the power from the first RF power source to the first group of antennas.