The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2017
Filed:
Dec. 18, 2013
Applicant:
Tpk Touch Solutions Inc., Taipei, Taiwan, CN;
Inventors:
Chen-Yu Liu, Taoyuan, CN;
Lu-Hsing Lee, Taoyuan, CN;
Assignee:
TPK Touch Solutions Inc., Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/042 (2006.01); G06F 3/041 (2006.01); G06F 3/044 (2006.01); H05K 1/02 (2006.01); H05K 3/28 (2006.01);
U.S. Cl.
CPC ...
G06F 3/0416 (2013.01); G06F 3/044 (2013.01); H05K 1/0274 (2013.01); G06F 2203/04103 (2013.01); H05K 1/0289 (2013.01); H05K 3/28 (2013.01); H05K 2203/0577 (2013.01);
Abstract
A manufacturing process for forming a touch structure utilizes a first anti-etching optical layer to define the electrodes pattern and utilizes a second anti-etching optical layer to define the traces pattern. The first anti-etching optical layer and the second anti-etching optical layer do not need to be removed. The refractive index of the first anti-etching optical layer and the refractive index of the second anti-etching optical layer can be adjusted to reduce the display difference between the etched region and the non-etched region.