The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2017

Filed:

Apr. 18, 2007
Applicants:

Craig P. Stephens, Lake Oswego, OR (US);

Matt Kanetomi, Tigard, OR (US);

Joseph Richardson, Sherwood, OR (US);

Chris Veazey, Tualatin, OR (US);

Aaron Labrie, Oregon City, OR (US);

Inventors:

Craig P. Stephens, Lake Oswego, OR (US);

Matt Kanetomi, Tigard, OR (US);

Joseph Richardson, Sherwood, OR (US);

Chris Veazey, Tualatin, OR (US);

Aaron LaBrie, Oregon City, OR (US);

Assignee:

Novellus Systems, Inc., Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H01L 21/687 (2006.01); C23C 14/50 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
C23C 14/505 (2013.01); C23C 16/4584 (2013.01); C23C 16/4588 (2013.01); H01L 21/68764 (2013.01);
Abstract

A rotatable wafer chuck includes chuck arms and wafer holders that are aerodynamically shaped to reduce turbulence during rotation. A wafer holder may include a friction support and an independently rotatable vertical alignment member and clamping member that is shaped to reduce drag. The shape reduces turbulence during edge bevel etching to improve the uniformity of the edge exclusion and during high-speed rotation to improve particle performance.


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