The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2017
Filed:
Mar. 18, 2014
Osaka Gas Co., Ltd., Osaka-shi, JP;
Takahisa Utaki, Osaka, JP;
Shota Kawashima, Osaka, JP;
Kenji Seki, Osaka, JP;
Yuhei Morita, Osaka, JP;
Osaka Gas Co., Ltd., Osaka, JP;
Abstract
The rate of recovery of a purification target gas from a gas purification apparatus that uses a PSA device is improved, and both a high purity and a high recovery rate are achieved with good power efficiency. The present invention is directed to a gas purification method using the PSA method, in which a carbon molecular sieve having a pore volume, at a pore diameter of 0.38 nm or more, of not exceeding 0.05 cm/g and a pore volume, at a pore diameter of 0.34 nm, of 0.15 cm/g or more, in a pore diameter distribution measured by the MP method is used as an adsorbent, and, in an adsorption step, a miscellaneous gas is adsorbed from a source gas by bringing the source gas into contact with the adsorbent for 10 seconds or more and 6000 seconds or less so as to obtain a concentrated methane.