The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2017

Filed:

Feb. 05, 2016
Applicant:

Infineon Technologies Americas Corp., El Segundo, CA (US);

Inventors:

Jianwei Wan, Woodbury, MN (US);

Scott Nelson, River Falls, WI (US);

Srinivasan Kannan, Maplewood, MN (US);

Peter Kim, Stillwater, MN (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/338 (2006.01); H01L 29/732 (2006.01); H01L 31/109 (2006.01); H01L 29/205 (2006.01); H01L 29/20 (2006.01); H01L 29/778 (2006.01); H01L 31/0304 (2006.01); H01L 31/18 (2006.01); H01L 33/00 (2010.01); H01L 33/12 (2010.01); H01L 33/32 (2010.01); H01S 5/323 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/205 (2013.01); H01L 21/0254 (2013.01); H01L 21/02458 (2013.01); H01L 29/2003 (2013.01); H01L 29/778 (2013.01); H01L 31/03044 (2013.01); H01L 31/109 (2013.01); H01L 31/1856 (2013.01); H01L 33/0025 (2013.01); H01L 33/0075 (2013.01); H01L 33/12 (2013.01); H01L 33/32 (2013.01); H01S 5/32341 (2013.01);
Abstract

There are disclosed herein various implementations of a semiconductor component with a multi-layered nucleation body and method for its fabrication. The semiconductor component includes a substrate, a nucleation body situated over the substrate, and a group III-V semiconductor device situated over the nucleation body. The nucleation body includes a bottom layer formed at a low growth temperature, and a top layer formed at a high growth temperature. The nucleation body also includes an intermediate layer that is formed substantially continuously using a varying intermediate growth temperature.


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