The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2017
Filed:
Jul. 17, 2015
Applicant:
Novellus Systems, Inc., Fremont, CA (US);
Inventors:
Jonathan D. Mohn, Saratoga, CA (US);
Shawn M. Hamilton, Boulder Creek, CA (US);
Harald te Nijenhuis, San Jose, CA (US);
Jeffrey E. Lorelli, Fremont, CA (US);
Kevin Madrigal, Santa Cruz, CA (US);
Assignee:
Novellus Systems, Inc., San Jose, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
B05B 1/26 (2006.01); H01J 37/32 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32633 (2013.01); C23C 16/45565 (2013.01); C23C 16/45589 (2013.01); H01J 37/3244 (2013.01);
Abstract
Apparatuses and techniques for providing for variable radial flow conductance within a semiconductor processing showerhead are provided. In some cases, the radial flow conductance may be varied dynamically during use. In some cases, the radial flow conductance may be fixed but may vary as a function of radial distance from the showerhead centerline. Both single plenum and dual plenum showerheads are discussed.