The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2017
Filed:
Sep. 03, 2009
Applicant:
Fenggang Zhang, Beijing, CN;
Inventor:
Fenggang Zhang, Beijing, CN;
Assignee:
Beijing NMC Co., Ltd., Beijing, CN;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/50 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32568 (2013.01); C23C 14/50 (2013.01); H01J 37/32009 (2013.01); H01J 37/32605 (2013.01); H01J 37/32715 (2013.01); H01L 21/6831 (2013.01); H01L 21/68785 (2013.01); H01L 21/68792 (2013.01); H01L 21/67069 (2013.01);
Abstract
A plasma processing apparatus () comprises an outer shell () which is provided with a reaction chamber () in the interior, a bottom electrode which is arranged in the reaction chamber () and a cantilever support device () which goes through the outer shell () and supports the bottom electrode. The cantilever support device () is pivotally mounted on the side wall of the outer shell () and can rotate in the outer shell (). The plasma processing apparatus () further comprises a locating device so as to selectively fix the relative position of the cantilever support device () and the outer shell ().