The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2017
Filed:
Mar. 17, 2014
Applicant:
Starfire Industries, Llc, Champaign, IL (US);
Inventors:
Robert A. Stubbers, Champaign, IL (US);
Daniel P. Menet, Champaign, IL (US);
Michael J. Williams, Mahomet, IL (US);
Brian E. Jurczyk, Champaign, IL (US);
Assignee:
STARFIRE INDUSTRIES, LLC, Champaign, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 7/24 (2006.01); H01J 37/32 (2006.01); H05H 1/02 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32009 (2013.01); H05H 1/02 (2013.01);
Abstract
Systems and methods are described herein for coupling electromagnetic (EM) energy from a remotely-located primary antenna into a plasma ion source. The EM energy is radiated by a first by through an intermediary secondary antenna. The embodiments described herein enable the elevation of the plasma ion source to a high electric potential bias relative to the primary antenna, which can be maintained at or near a grounded electric potential.