The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2017

Filed:

Jul. 12, 2013
Applicants:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Stmicroelectronics SA, Montrouge, FR;

Inventors:

Yann Lamy, Saint Etienne de Crossey, FR;

Olivier Guiller, Grenoble, FR;

Sylvain Joblot, Bizonnes, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01G 4/30 (2006.01); H05K 1/18 (2006.01); H01G 4/33 (2006.01); H01G 4/38 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01G 4/306 (2013.01); H01G 4/33 (2013.01); H01G 4/38 (2013.01); H01L 28/87 (2013.01); H01L 28/91 (2013.01); H05K 1/181 (2013.01);
Abstract

A method for producing a capacitor stack in one portion of a substrate, the method including: forming a cavity along a thickness of the portion of the substrate from an upper face of the substrate, depositing a plurality of layers contributing to the capacitor stack onto the wall of the cavity and onto the surface of the upper face, and removing matter from the layers until the surface of the upper face is reached. The forming of the cavity includes forming at least one trench and, associated with each trench, at least one box. The at least one trench includes a trench outlet that opens into the box. The box includes a box outlet that opens at the surface of the upper face, and the box outlet being shaped to be larger than the trench outlet.


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