The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2017

Filed:

Aug. 20, 2015
Applicant:

Samsung Display Co., Ltd., Yongin-si, Gyeonggi-do, KR;

Inventors:

Hi-Kuk Lee, Yongin-si, KR;

Jae-Young Jang, Suwon-si, KR;

Jae-Hyuk Chang, Seongnam-si, KR;

Sang-Don Jang, Suwon-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70275 (2013.01); G03F 7/70291 (2013.01); G03F 7/70358 (2013.01); G03F 7/70558 (2013.01);
Abstract

A maskless exposure device including a light source configured to emit an exposure beam, a light modulation element configured to modulate the exposure beam according to an exposure pattern, a projection optical system configured to transfer a modulated exposure beam to a substrate as a beam spot array, a beam measurement part configured to measure a beam data of the beam spot array, and a compensating mask generator configured to generate a compensating mask by utilizing a measured data of the exposure beam for compensating cumulative illumination, wherein the compensating mask generator is configured to turn off left and right beams of a first selected spot beam selected by the beam data, and then to turn off a second selected spot beam.


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