The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2017
Filed:
Oct. 24, 2014
Applicant:
Boe Technology Group Co., Ltd., Beijing, CN;
Inventor:
Xuelan Wang, Beijing, CN;
Assignee:
BOE Technology Group Co., Ltd., Beijing, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/004 (2006.01); G03F 7/031 (2006.01); G03F 7/033 (2006.01); G03F 7/075 (2006.01); G03F 7/105 (2006.01); G03F 7/029 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); G03F 7/0048 (2013.01); G03F 7/029 (2013.01); G03F 7/031 (2013.01); G03F 7/033 (2013.01); G03F 7/0755 (2013.01); G03F 7/105 (2013.01);
Abstract
A photoresist composition, comprising: from 0.1 to 1.0 parts of a polyether-modified organosilicon levelling agent 58; from 7 to 23 parts of a polyfunctional monomer; from 13 to 29 parts of a alkaline soluble resin; from 23 to 62.8 parts of a pigment dispersion; from 1.5 to 11.9 parts of a photo-initiator; and from 10 to 45 parts of a solvent, on the basis of parts by weight. The photoresist composition can solve the problem of poor levelling property of the coating film and shrinkage of the film surface after high temperature baking occurring in the existing photoresist composition.