The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2017
Filed:
Jul. 27, 2012
Yukio Kaneko, Tokyo, JP;
Yoshihisa Soutome, Tokyo, JP;
Yoshitaka Bito, Tokyo, JP;
Hiroyuki Takeuchi, Tokyo, JP;
Tetsuhiko Takahashi, Tokyo, JP;
Hideta Habara, Tokyo, JP;
Yosuke Otake, Tokyo, JP;
Yukio Kaneko, Tokyo, JP;
Yoshihisa Soutome, Tokyo, JP;
Yoshitaka Bito, Tokyo, JP;
Hiroyuki Takeuchi, Tokyo, JP;
Tetsuhiko Takahashi, Tokyo, JP;
Hideta Habara, Tokyo, JP;
Yosuke Otake, Tokyo, JP;
HITACHI, LTD., Tokyo, JP;
Abstract
Systems and methods for magnetic resonance imaging, including adjusting spatial distribution of a rotating magnetic field. By minimizing imaging time, the Bnonuniformity reducing effect of RF shimming is maximized for an imaging section of an arbitrary axis direction and an arbitrary position. Bdistributions are measured for only several sections of one predetermined direction, and a radio frequency magnetic field condition that maximizes the Bnon-uniformity reducing effect for an imaging section of an arbitrary direction and an arbitrary position is calculated from the Bdistribution data.