The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2017

Filed:

Jul. 21, 2015
Applicant:

Chaun-choung Technology Corp., New Taipei, TW;

Inventors:

Shih-Ming Wang, New Taipei, TW;

Pang-Hung Liao, New Taipei, TW;

Cheng-Tu Wang, New Taipei, TW;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F28D 15/00 (2006.01); F28D 15/04 (2006.01); B23P 15/26 (2006.01); H01L 23/427 (2006.01); H01L 21/48 (2006.01);
U.S. Cl.
CPC ...
F28D 15/04 (2013.01); B23P 15/26 (2013.01); B23P 2700/09 (2013.01); H01L 21/4882 (2013.01); H01L 23/427 (2013.01);
Abstract

A vapor chamber having no gas discharging protrusion includes: a lower shell member, formed with an upper surface divided into an inner zone and an outer zone and an outer peripheral wall formed with a planar surface, the inner zone is formed with capillary channels, the outer zone is formed with a recess, and one thereof is communicated with at least one of the capillary channels and the other end thereof penetrates the planar surface; and an upper shell member, engaged with the upper surface and sealed with the lower shell member, and a gas discharging hole is formed between the recess and the upper shell member. Accordingly, a conventional gas discharging protrusion is not required on the vapor chamber thereby advantages of small and thin in volume and compact in structure being provided.


Find Patent Forward Citations

Loading…