The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2017
Filed:
Apr. 30, 2014
Applicant:
Cabot Corporation, Boston, MA (US);
Inventors:
Qingling Zhang, Bloomfield Hills, MI (US);
Bennett Greenwood, Somerville, MA (US);
Ravi Sharma, Acton, MA (US);
Geoffrey D. Moeser, Groton, MA (US);
Brian G. Prevo, Portland, OR (US);
Mark J. Hampden-Smith, Chelmsford, MA (US);
Assignee:
Cabot Corporation, Boston, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C09G 1/02 (2006.01); B24B 37/04 (2012.01); C09K 3/14 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 37/044 (2013.01); C09K 3/1409 (2013.01); C09K 3/1463 (2013.01);
Abstract
CMP processes, tools and slurries utilize composite particles that include core particles having organosilica particles disposed about the core particles. Using these processes, tools and slurries can enhance removal rates, reduce defectivity and increase cleanability with respect to comparable systems and substrates.