The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2017

Filed:

Nov. 14, 2016
Applicant:

Asahi Glass Company, Limited, Chiyoda-ku, JP;

Inventors:

Shigeru Aida, Chiyoda-ku, JP;

Daisuke Taguchi, Chiyoda-ku, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 214/26 (2006.01); C08F 214/18 (2006.01); C08F 2/06 (2006.01); C08F 214/28 (2006.01); C08F 222/02 (2006.01);
U.S. Cl.
CPC ...
C08F 214/26 (2013.01); C08F 2/06 (2013.01); C08F 214/18 (2013.01); C08F 214/184 (2013.01); C08F 214/28 (2013.01); C08F 222/02 (2013.01);
Abstract

Provided is an effective process for producing a fluorinated polymer excellent in adhesion, by using a polymerization medium having a low ozone layer destruction potential. The process includes polymerizing a monomer mixture comprising a fluorinated monomer and a polar functional group containing monomer (excluding one having a fluorine atom) in a polymerization medium that contains a medium compound represented by CHF—O—CHF, m is an integer of from 1 to 6, n is an integer of from 1 to 6, x is from 0 to (2m+1), y is from 0 to 2n, and (x+y) is at least 1), and wherein a solution obtained by dissolving the polar functional group-containing monomer in the polymerization medium is continuously or intermittently added to a polymerization reaction system.


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