The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2017

Filed:

Jan. 17, 2017
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Jun Yamanobe, Kanagawa, JP;

Hiroshi Mataki, Kanagawa, JP;

Hiroshi Inoue, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 2/165 (2006.01);
U.S. Cl.
CPC ...
B41J 2/16535 (2013.01); B41J 2/16544 (2013.01); B41J 2002/1655 (2013.01); B41J 2002/16558 (2013.01);
Abstract

Provided are a wiping mechanism, a liquid droplet jetting apparatus, and a wiping method capable of securing an absorption capacity of a wiping member which absorbs a liquid adhered to a nozzle surface while preventing infiltration of bubbles into a nozzle when the nozzle surface is wiped by the wiping member. The nozzle surface is wiped by the wiping member which has one surfaceA that comes into contact with the nozzle surface in which a plurality of nozzles through which liquid droplets are jetted are formed, and has a plurality of voids M that form capillaries from the one surfaceA side to the other surfaceB side, the voids M being greater in size on the other surfaceB side than on the one surface sideA among the plurality of voids M.


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