The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2017
Filed:
Nov. 26, 2013
Lg Chem, Ltd., Seoul, KR;
Hyun Kuk Noh, Daejeon, KR;
Hong Kyu Park, Daejeon, KR;
Ji Hoon Ryu, Daejeon, KR;
Wang Mo Jung, Daejeon, KR;
Sang Seung Oh, Daejeon, KR;
Chi Ho Jo, Daejeon, KR;
LG Chem, Ltd., , KR;
Abstract
Disclosed is a method of preparing inorganic particles using a hydrothermal synthesis device, including introducing a precursor liquid or slurry stream including a reaction precursor for preparation of an inorganic material into a hydrothermal synthesis reactor, introducing a supercritical liquid stream including water into the hydrothermal synthesis reactor, preparing an inorganic slurry by hydrothermal reaction in the hydrothermal synthesis reactor and discharging the inorganic slurry therefrom, and filtering the discharged inorganic slurry, wherein the precursor liquid or slurry stream includes an NHsource at a high temperature of the supercritical liquid stream and thus clogging of the stream in the hydrothermal synthesis reactor is inhibited by pH changes in the hydrothermal reaction.