The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2017
Filed:
Jan. 08, 2016
Applicant:
Everspin Technologies, Inc., Chandler, AZ (US);
Inventors:
Chaitanya Mudivarthi, Sunnyvale, CA (US);
Sarin A. Deshpande, Chandler, AZ (US);
Sanjeev Aggarwal, Scottsdale, AZ (US);
Assignee:
EVERSPIN TECHNOLOGIES, INC., Chandler, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 43/12 (2006.01); H01L 43/08 (2006.01); H01L 27/22 (2006.01); G11B 5/31 (2006.01); H01L 43/02 (2006.01);
U.S. Cl.
CPC ...
H01L 43/12 (2013.01); G11B 5/3163 (2013.01); H01L 27/222 (2013.01); H01L 27/228 (2013.01); H01L 43/02 (2013.01); H01L 43/08 (2013.01); Y10T 29/49021 (2015.01);
Abstract
Methods for manufacturing magnetoresistive devices are presented in which isolation of magnetic layers in the magnetoresistive stack is achieved by oxidizing exposed sidewalls of the magnetic layers prior to subsequent etching steps. Etching the magnetic layers using a non-reactive gas further prevents degradation of the sidewalls.
Mudivarthi, Chaitanya. (2017). Isolation of magnetic layers during etch in a magnetoresistive device (U.S. Patent No. 9722176). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9722176
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile