The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2017

Filed:

Aug. 04, 2016
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Takayuki Koizumi, Yokohama, JP;

Toshihiko Ouchi, Machida, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/15 (2006.01); H01L 31/167 (2006.01); G01J 5/20 (2006.01); H01L 31/0216 (2014.01); H01L 31/0304 (2006.01); H01L 31/028 (2006.01); H01L 31/18 (2006.01); H01L 33/44 (2010.01); H01L 33/30 (2010.01); H01L 33/32 (2010.01); H01L 33/34 (2010.01); H01L 33/00 (2010.01);
U.S. Cl.
CPC ...
H01L 31/167 (2013.01); G01J 5/20 (2013.01); H01L 31/028 (2013.01); H01L 31/02161 (2013.01); H01L 31/0304 (2013.01); H01L 31/03044 (2013.01); H01L 31/03046 (2013.01); H01L 31/1828 (2013.01); H01L 33/0062 (2013.01); H01L 33/30 (2013.01); H01L 33/32 (2013.01); H01L 33/34 (2013.01); H01L 33/44 (2013.01);
Abstract

A photoconductive device that generates or detects terahertz radiation includes a semiconductor layer; a structure portion; and an electrode. The semiconductor layer has a thickness no less than a first propagation distance and no greater than a second propagation distance, the first propagation distance being a distance that the surface plasmon wave propagates through the semiconductor layer in a perpendicular direction of an interface between the semiconductor layer and the structure portion until an electric field intensity of the surface plasmon wave becomes 1/e times the electric field intensity of the surface plasmon wave at the interface, the second propagation distance being a distance that a terahertz wave having an optical phonon absorption frequency of the semiconductor layer propagates through the semiconductor layer in the perpendicular direction until an electric field intensity of the terahertz wave becomes 1/etimes the electric field intensity of the terahertz wave at the interface.


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