The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2017

Filed:

Sep. 19, 2012
Applicant:

Vishay-siliconix, Santa Clara, CA (US);

Inventors:

Robert Q. Xu, Fremont, CA (US);

Qufei Chen, San Jose, CA (US);

Assignee:

Vishay-Siliconix, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/72 (2006.01); H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 29/78 (2006.01); H01L 29/40 (2006.01); H01L 29/861 (2006.01); H01L 29/872 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66356 (2013.01); H01L 29/407 (2013.01); H01L 29/66143 (2013.01); H01L 29/66643 (2013.01); H01L 29/66666 (2013.01); H01L 29/7391 (2013.01); H01L 29/7828 (2013.01); H01L 29/7839 (2013.01); H01L 29/8613 (2013.01); H01L 29/8725 (2013.01); H01L 29/4236 (2013.01);
Abstract

In one embodiment, a breakdown voltage blocking device can include an epitaxial region located above a substrate and a plurality of source trenches formed in the epitaxial region. Each source trench can include a dielectric layer surrounding a conductive region. The breakdown voltage blocking device can also include a contact region located in an upper surface of the epitaxial region along with a gate trench formed in the epitaxial region. The gate trench can include a dielectric layer that lines the sidewalls and bottom of the gate trench and a conductive region located between the dielectric layer. The breakdown voltage blocking device can include source metal located above the plurality of source trenches and the contact region. The breakdown voltage blocking device can include gate metal located above the gate trench.


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