The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2017

Filed:

Aug. 21, 2015
Applicant:

The Board of Trustees of the Leland Stanford Junior University, Palo Alto, CA (US);

Inventor:

Timothy Stephen English, Derwood, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01J 37/20 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); C23C 16/45525 (2013.01); C23C 16/50 (2013.01); H01J 2237/2602 (2013.01);
Abstract

A method for preparing plan-view transmission electron microscopy specimens is disclosed. The method employs isotropic vapor-phase etching in conjunction with one or more integrated etch-stop layers that give rise to a support membrane having a well-controlled, substantially uniform thickness. In some embodiments, the support membrane comprises an etch-stop layer that is formed using a high-precision formation process, such as atomic-layer deposition, oxidation, and the like. As a result, formation of the support membrane does not require additional processes, such as mechanical polishing or ion milling, to achieve its desired thickness. The method enables reduced specimen-preparation time, as well as simultaneous preparation of multiple specimens having large, uniformly thick areas for imaging.


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