The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2017

Filed:

Mar. 17, 2014
Applicant:

Aditazz, Inc., San Bruno, CA (US);

Inventors:

Alexander Khainson, San Carlos, CA (US);

Zachary Deretsky, San Carlos, CA (US);

Deepak Aatresh, Saratoga, CA (US);

Ward A. Vercruysse, Portolla Valley, CA (US);

Richard L. Sarao, San Francisco, CA (US);

Sudha Hajela, Brisbane, CA (US);

Assignee:

ADITAZZ, INC., Brisbane, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06Q 50/22 (2012.01);
U.S. Cl.
CPC ...
G06F 17/5004 (2013.01); G06Q 50/22 (2013.01);
Abstract

Systems and methods for realizing a complex building system are disclosed. The systems and methods utilize computer-based techniques to rapidly explore large numbers of pattern matching scenarios on a scale which heretofore has not been attempted. In an embodiment, the computer-based technique performs large-scale pattern matching operations to find the best match between functional patterns and spatial patterns. For example, with reference to a particular building system, the technique involves operational modeling to identify the types and volumes of services to provide (functional patterns) and to characterize the physical relationships between the services (e.g., adjacency preferences), along with establishing libraries of three dimensional spaces (spatial patterns), in the form of room and department libraries and building massing configuration libraries. Large numbers of functional patterns and spatial patterns are then matched to each other using cost-based algorithms to find the best match or matches between the form and function.


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