The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2017

Filed:

May. 05, 2014
Applicant:

Honeywell International, Inc., Morristown, NJ (US);

Inventors:

James A. Strilich, Phoenix, AZ (US);

Paul F. McLaughlin, Ambler, PA (US);

W. Russell Massey, Levittown, PA (US);

Jethro F. Steinman, Haverford, PA (US);

Ananthapadmanabha Krishnamurthy, Bangalore, IN;

Assignee:

Honeywell International Inc., Morris Plains, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2011.01); G05B 19/418 (2006.01); H04L 29/08 (2006.01); H04L 29/06 (2006.01);
U.S. Cl.
CPC ...
G05B 19/4186 (2013.01); G05B 19/41855 (2013.01); H04L 67/12 (2013.01); H04L 69/18 (2013.01); G05B 2219/31115 (2013.01); G05B 2219/31348 (2013.01); G05B 2219/31369 (2013.01);
Abstract

An apparatus includes a first interface configured to communicate over a first industrial process control network using a first protocol. The apparatus also includes a second interface configured to communicate over a second industrial process control network using a second protocol. The apparatus further includes a third interface configured to communicate with at least one supervisory device over a third network. In addition, the apparatus includes at least one processing device configured to provide concurrent access for the at least one supervisory device to process control devices coupled to the first and second industrial process control networks during a migration of process control devices that use the first protocol to process control devices that use the second protocol.


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