The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2017
Filed:
Jun. 16, 2015
Stage apparatus, lithography apparatus, method of manufacturing an article, and determination method
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Satoshi Maruyama, Utsunomiya, JP;
Mitsuo Hirata, Utsunomiya, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/58 (2006.01); G03B 27/62 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70725 (2013.01); G03F 7/70758 (2013.01); G03F 7/70775 (2013.01);
Abstract
The present invention provides a stage apparatus including a stage being movable, comprising a driving unit configured to drive the stage by providing thrust to the stage, a measuring unit configured to measure a position of the stage, and a control unit configured to control the position of the stage by supplying, to the driving unit, a signal composed of a first signal for reducing a deviation between a current position of the stage and a target position, and a second signal for reducing vibration of the stage caused by a thrust ripple included in the thrust.