The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2017
Filed:
Sep. 30, 2011
Joseph V. Debartolo, Jr., Battle Ground, WA (US);
Scott Karlsen, Battle Ground, WA (US);
Rob Martinsen, West Linn, OR (US);
Jay Small, Salmon Creek, WA (US);
Joseph V. DeBartolo, Jr., Battle Ground, WA (US);
Scott Karlsen, Battle Ground, WA (US);
Rob Martinsen, West Linn, OR (US);
Jay Small, Salmon Creek, WA (US);
nLIGHT, Inc., Vancouver, WA (US);
Abstract
An intensity distribution management system includes a light source, a mask for receiving light therefrom and for allowing some light to propagate through and past the mask, a surface for receiving light allowed past the mask, and a diffusive element disposed between the mask and the light source for ensuring a substantially even light intensity distribution in relation to the surface. An imaging method includes emitting a light beam, manipulating the beam to have a first numerical aperture across a first divergence axis, directing the beam through a diffusive element to increase the numerical aperture of the beam, directing the beam through one or more transmissive portions of a mask, the mask being disposed relative to the diffusive element, and imaging transmitted portions of the beam to a target surface wherein the beam has a substantially ripple-free and uniform intensity distribution across the first divergence axis at the target surface.