The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2017
Filed:
Sep. 15, 2016
Johnson Matthey Plc, London, GB;
Harry Coles, Ely, GB;
Ian Hutchings, Cambridge, GB;
Damian Gardiner, Cambridge, GB;
Wen-Kai Hsiao, Cambridge, GB;
Philip Hands, Edinburgh, GB;
Stephen Morris, Cambridge, GB;
Timothy Wilkinson, Willingham, GB;
Johnson Matthey PLC, Cleveland, GB;
Abstract
A method of manufacturing a security feature for identifying objects or documents of value. The method may include the steps of encoding information in a pattern; and ink jet printing a chiral nematic liquid crystal material from a reservoir using a print head on to a substrate in the pattern. Thus, the method forms a patterned array of chiral nematic liquid crystal material deposits. The print head, or the reservoir, or both, may be heated to a temperature above the clearing point of the chiral nematic liquid crystal material. The chiral axes of the chiral nematic liquid crystal material deposits may be aligned substantially perpendicular to the substrate such that a predetermined portion of the electromagnetic spectrum is selectively reflected over other regions of the electromagnetic spectrum by the chiral nematic liquid crystal material deposits.