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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9718935 B1

PDFFull Text
Date of Patent:
Aug. 01, 2017

Filed:

Apr. 20, 2016

Method of preparing article with polyaniline pattern

Applicant:

Eastman Kodak Company, Rochester, NY (US);

Inventors:

Thomas B. Brust, Webster, NY (US);

Anne Troxell Wyand, Victor, NY (US);

Grace Ann Bennett, Scottsville, NY (US);

Catherine A. Falkner, Rochester, NY (US);

Assignee:

EASTMAN KODAK COMPANY, Rochester, NY (US);

Attorney:

J. Lanny Tucker

Primary Examiner:

Chanceity Robinson

Int. Cl.
CPC ...
G03F 7/027 (2006.01); C08J 7/16 (2006.01); H01B 1/12 (2006.01); C08F 212/14 (2006.01); C08J 7/04 (2006.01); C08J 7/12 (2006.01); C08G 73/02 (2006.01); B05D 7/04 (2006.01); B05D 3/06 (2006.01); B05D 3/10 (2006.01); B05D 7/00 (2006.01); H05K 3/02 (2006.01); H05K 3/10 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
C08J 7/16 (2013.01); B05D 3/067 (2013.01); B05D 3/101 (2013.01); B05D 7/04 (2013.01); B05D 7/544 (2013.01); B05D 7/584 (2013.01); C08F 212/14 (2013.01); C08G 73/0266 (2013.01); C08J 7/047 (2013.01); C08J 7/123 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); H01B 1/128 (2013.01); H05K 3/02 (2013.01); H05K 3/105 (2013.01); C08J 2367/02 (2013.01); C08J 2425/08 (2013.01);
Abstract

A method is used to provide an electrically-conductive polyaniline patterns on a substrate. A photocurable composition is applied as a pattern, comprising a water-soluble reactive polymer comprising (a) greater than 40 mol % of recurring units comprising sulfonic acid or sulfonate groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition. The pattern is exposed to radiation sufficient to cause crosslinking via [2+2] photocycloaddition of the (b) recurring units to form a pattern of crosslinked polymer. The crosslinked polymer is contacted with an aniline reactive composition comprising an aniline monomer and up to 0.5 molar of an aniline oxidizing agent, in a molar ratio of from 1:0.5 to 1:1.5 of the aniline monomer to the aniline oxidizing agent. A pattern of electrically-conductive polyaniline disposed within, on top of, or both within and on top of, the crosslinked polymer only.

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