The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2017
Filed:
Feb. 13, 2014
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Hiroshi Niino, Tokyo, JP;
Saori Kikuchi, Hiroshima, JP;
Mitsubishi Chemical Corporation, Tokyo, JP;
Abstract
Provided is (1) a radically polymerizable polyether which imparts excellent mechanical properties including excellent transparency, a high degree of elongation at break and high bending strength to a copolymer produced by the radical polymerization of a radically polymerizable monomer, and a method for producing the radically polymerizable polyether; (2) a polymerizable composition comprising the radically polymerizable polyether and a radically polymerizable vinyl monomer, which enables the formation of a copolymer having excellent mechanical properties; and (3) a copolymer, a molded article and a film, each of which comprises the copolymer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile