The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2017

Filed:

Jul. 08, 2014
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Se Won Baek, Daejeon, KR;

Jong Hun Song, Daejeon, KR;

Sul Hee Yoo, Daejeon, KR;

Yoon Jae Min, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 51/48 (2006.01); C07C 51/44 (2006.01); B01D 3/14 (2006.01); B01D 11/04 (2006.01); B01D 53/14 (2006.01); B01D 53/18 (2006.01); C07C 51/43 (2006.01); C07C 51/16 (2006.01);
U.S. Cl.
CPC ...
C07C 51/48 (2013.01); B01D 3/143 (2013.01); B01D 11/0484 (2013.01); B01D 11/0488 (2013.01); B01D 53/1418 (2013.01); B01D 53/18 (2013.01); C07C 51/43 (2013.01); C07C 51/44 (2013.01); C07C 51/16 (2013.01);
Abstract

This disclosure relates to a method of continuous recovery of (meth)acrylic acid and an apparatus used for the recovery method. The method of continuous recovery of (meth)acrylic acid according to the present invention may effectively remove scum formed in the continuous recovery process of (meth)acrylic acid, and simultaneously recover (meth)acrylic acid with excellent efficiency, thus enabling more stable operation of the continuous process.


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