The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2017

Filed:

Feb. 08, 2013
Applicant:

Photo Stencil, Llc, Colorado Spring, CO (US);

Inventors:

William E. Coleman, Colorado Springs, CO (US);

Brad Keiser, Colorado Springs, CO (US);

Assignee:

PHOTO STENCIL, LLC, Colorado Springs, CO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/02 (2006.01); B41F 15/34 (2006.01); B41F 15/00 (2006.01); C25D 1/10 (2006.01); B41C 1/14 (2006.01); B41N 1/24 (2006.01); H01L 31/0224 (2006.01);
U.S. Cl.
CPC ...
B41F 15/34 (2013.01); B41C 1/14 (2013.01); B41F 15/00 (2013.01); B41N 1/24 (2013.01); C25D 1/10 (2013.01); H01L 31/022425 (2013.01); Y02E 10/50 (2013.01);
Abstract

A method is disclosed for electroforming metal screen. The method deposits photoresist over a mandrel, and then exposes the photoresist with light through a plurality of openings in a photo tool to form hardened resist pillars. Unexposed photoresist is removed without affecting the resist pillars. The method then electroforms the metal screen in areas free of the hardened resist pillars such that the metal screen forms apertures defined by each of the resist pillars, a space between at least two of the resist pillars defining a support bar that forms at a reduced thickness as compared to portions of the metal screen that are not between the resist pillars. Finally, the method detaches the metal screen from the mandrel.


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