The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2017
Filed:
Nov. 15, 2016
Rohm Co., Ltd., Kyoto, JP;
Tatsuya Suzuki, Kyoto, JP;
Yoshikazu Fujimori, Kyoto, JP;
ROHM CO., LTD., Kyoto, JP;
Abstract
A resist mask, having penetrating holes, is formed on a rear surface of a silicon substrate. A planar shape of each penetrating holeis formed to a shape with which its respective sides are curved to inwardly convex arcuate shapes with respect to a regular quadrilateral that is a target shape of a transverse section at a processing ending end side of a corresponding cavity. Next, dry etching is applied to the silicon substrate. The cavitiesare thereby formed in the silicon substrate. As the etching progresses, a transverse sectional shape of each cavitydecreases in inward projection amounts of the respective arcuate shaped sides in the transverse sectional shape of the corresponding penetrating holeof the resist mask. At a processing ending end side of the cavity, its planar shape is substantially the same shape as the regular quadrilateral that is the target shape.