The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 25, 2017

Filed:

Aug. 05, 2014
Applicant:

Sharp Kabushiki Kaisha, Osaka, JP;

Inventors:

Tohru Sonoda, Osaka, JP;

Shinichi Kawato, Osaka, JP;

Satoshi Inoue, Osaka, JP;

Satoshi Hashimoto, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 14/24 (2006.01); H05B 33/10 (2006.01); H01L 21/02 (2006.01); H01L 51/56 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45578 (2013.01); C23C 14/24 (2013.01); C23C 14/243 (2013.01); H01L 21/02263 (2013.01); H05B 33/10 (2013.01); H01L 51/001 (2013.01); H01L 51/56 (2013.01);
Abstract

A vapor deposition device () in accordance with the present invention is a vapor deposition device for forming a film on a film formation substrate (), the vapor deposition device including a vapor deposition source () that has an injection hole () from which vapor deposition particles are injected, a vapor deposition particle crucible () for supplying the vapor deposition particles to the vapor deposition source (), and a rotation motor () for changing a distribution of the injection amount of the vapor deposition particles by rotating the vapor deposition source ().


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