The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2017
Filed:
Oct. 08, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Robert B. Moore, Bigfork, MT (US);
Vincent Steffan Francischetti, Columbia Falls, MT (US);
Assignee:
APPLIED Materials, Inc., Santa Clara, CA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/02 (2006.01); C23C 16/44 (2006.01); C23C 18/16 (2006.01); C25D 5/34 (2006.01); C25D 17/00 (2006.01); C25D 17/06 (2006.01); C23C 18/18 (2006.01);
U.S. Cl.
CPC ...
C23C 16/0227 (2013.01); C23C 16/44 (2013.01); C23C 18/163 (2013.01); C23C 18/1619 (2013.01); C23C 18/1803 (2013.01); C23C 18/1851 (2013.01); C25D 5/34 (2013.01); C25D 17/001 (2013.01); C25D 17/06 (2013.01);
Abstract
A processing apparatus may include a down-facing substrate processing chamber fixed at acute angle to horizontal. A chuck plate on a platform may pivot from an open position wherein the platform is at an acute angle to the processing chamber, to a parallel position wherein the platform is parallel to the processing chamber. The chuck plate may then be moved linearly into sealing engagement with the processing chamber. A chuck holder may be provided on the platform to hold the chuck in place.