The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
May. 05, 2015
Eastman Kodak Company, Rochester, NY (US);
Kurt D. Sieber, Rochester, NY (US);
Ronald Steven Cok, Rochester, NY (US);
Gary Alan Kneezel, Webster, NY (US);
EASTMAN KODAK COMPANY, Rochester, NY (US);
Abstract
An atmospheric-pressure plasma treatment system includes a plasma source including at least one electrode, a gas in a gas chamber, and an AC power supply that supplies power to the at least one electrode to form a plasma in the gas. A radial-flow surface has a jet nozzle through which the gas flows and the radial-flow surface has a surface profile that conforms to a nonplanar treatment surface of an object. The radial-flow surface is separated from the nonplanar treatment surface by a gap that is less than 2 times a diameter of the jet nozzle so that the gas flows radially outward from the nozzle and between the radial-flow surface and the nonplanar treatment surface.