The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
Jan. 10, 2017
Applicant:
Advanced Energy Industries, Inc., Fort Collins, CO (US);
Inventors:
Michael Mueller, Loveland, CO (US);
Myeong Yeol Choi, Fort Collins, CO (US);
Assignee:
Advanced Energy Industries, Inc., Fort Collins, CO (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32155 (2013.01); H01J 37/3299 (2013.01); H01J 37/32146 (2013.01); H01J 37/32174 (2013.01); H01J 37/32183 (2013.01); H01J 37/32935 (2013.01);
Abstract
This disclosure describes systems, methods, and apparatus for pulsed RF power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial RF frequency for each pulse. This fixed initial RF frequency is then used at the start of each pulse during a processing phase, where a real substrate is used and processed in the chamber.