The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
Aug. 16, 2016
Yissum Research Development Company of Hebrew University of Jerusalem, Ltd., Jerusalem, IL;
Hil Applied Medical Ltd., Omer, IL;
Arie Zigler, Rishon Le Tzion, IL;
Shmuel Eisenmann, Tel Aviv, IL;
Tala Palchan, Jerusalem, IL;
Sagi Brink-Danan, Jerusalem, IL;
Eyal Gad Nahum, Jerusalem, IL;
YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM, LTD., Jerusalem, IL;
HIL APPLIED MEDICAL LTD., Omer, IL;
Abstract
The present invention discloses a system and method for generating a beam of fast ions. The system comprising: a target substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and; a beam unit adapted for receiving a high power coherent electromagnetic radiation beam and providing an electromagnetic radiation beam having a main pulse and a pre-pulse and focusing it onto said patterned surface of the target substrate to cause interaction between said radiation beam and said substrate enabling creation of fast ions.