The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2017

Filed:

May. 17, 2016
Applicant:

Western Digital (Fremont), Llc, Fremont, CA (US);

Inventors:

Xiaoyu Yang, Union City, CA (US);

Jinqiu Zhang, Fremont, CA (US);

Feng Liu, San Ramon, CA (US);

Xiaotian Zhou, Fremont, CA (US);

Hai Sun, Milpitas, CA (US);

Ming Jiang, San Jose, CA (US);

Assignee:

WESTERN DIGITAL (FREMONT), LLC, Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/187 (2006.01); G11B 5/11 (2006.01);
U.S. Cl.
CPC ...
G11B 5/187 (2013.01); G11B 5/112 (2013.01);
Abstract

A method provides magnetic write apparatus. A side shield location layer having a location corresponding to the side shield(s) and back and side surfaces is provided. Part of the back surface corresponds to the back surface of the side shield. A nonmagnetic layer adjoining the back and side surface(s) of the side shield location layer is provided. A pole trench is formed in the layers using a first etch process. The nonmagnetic and side shield location layers have an etch selectivity of at least 0.9 and not more than 1.1 for the first etch. A pole is provided in the pole trench. A remaining portion of the side shield location layer is removed using a wet etch. The nonmagnetic layer is nonremovable by the wet etch. Side shield(s) having a back surface substantially the same as the back surface of the side shield location layer are provided.


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