The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2017

Filed:

Dec. 16, 2015
Applicants:

Riso Kagaku Corporation, Tokyo, JP;

Nisca Corporation, Minamikoma-gun, Yamanashi-ken, JP;

Inventor:

Junya Ozawa, Yamanashi-ken, JP;

Assignees:

RISO KAGAKU CORPORATION, Tokyo, JP;

NISCA CORPORATION, Minamikoma-gun, Yamanashi-ken, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/20 (2006.01); H04N 1/00 (2006.01);
U.S. Cl.
CPC ...
G06F 1/20 (2013.01); H04N 1/00519 (2013.01);
Abstract

In a blast mechanism for optimizing an air blast in the main scanning direction and an air blast in the sub-scanning direction so as not to affect reading accuracy of an image, a first blast path for sending air in the main scanning direction and a second blast path for sending air in the sub-scanning direction are formed inside the housing, and collection efficiencies of air filters of the blast paths are set so that the efficiency in the main scanning direction is high than that in the sub-scanning direction. The blast mechanism includes a casing, first and second blast paths in the main and sub-scanning directions disposed in the casing, and air filters disposed in the respective blast paths. The dust collection efficiencies of the air filters are set so that the filter of the first blast path is higher than the filter of the second blast path.


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