The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
Aug. 22, 2013
Dai Nippon Printing Co., Ltd., Tokyo-to, JP;
Minoru Azakami, Tokyo-to, JP;
Koji Eto, Tokyo-to, JP;
Nobuko Oikawa, Tokyo-to, JP;
Eriko Hamade, Tokyo-to, JP;
Keisuke Miura, Tokyo-to, JP;
DAI NIPPON PRINTING CO., LTD., Tokyo-to, JP;
Abstract
The present invention is to provide: a photosensitive composition for volume hologram recording and a photosensitive substrate for volume hologram recording, which provide increased sensitivity during hologram recording and a high refractive index modulation amount, and which do not inhibit the decolorization of the sensitizing dye; and a volume hologram recorded medium which provides high-luminance hologram images with increased productivity. Disclosed is a photosensitive composition for volume hologram recording, comprising: a photopolymerizable monomer, a photopolymerization initiator, a sensitizing dye for sensitizing the photopolymerization initiator, a binder resin, and a thiol group-containing compound, wherein the photopolymerizable monomer contains a photoradically polymerizable monomer and a photocationically polymerizable monomer; wherein the thiol group-containing compound is a chain transfer agent for the photoradically polymerizable monomer and is a polyfunctional secondary thiol compound having two or more secondary thiol groups per molecule; and wherein the content of the thiol group-containing compound is 1.5 to 30 parts by mass with respect to 100 parts by mass of the photoradically polymerizable monomer.