The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2017

Filed:

Oct. 09, 2014
Applicant:

Powerchip Technology Corporation, Hsinchu, TW;

Inventors:

Jyun-Da Wu, Taoyuan County, TW;

Shih-Tsung Hsiao, Hsinchu, TW;

Chien-Chung Chen, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2011.01); F27D 19/00 (2006.01); G05B 19/418 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
F27D 19/00 (2013.01); G05B 19/418 (2013.01); H01L 21/67253 (2013.01); H01L 21/67778 (2013.01); G05B 2219/45031 (2013.01); G05B 2219/45132 (2013.01); Y02P 90/20 (2015.11);
Abstract

A dispatch control method for a furnace process including the following steps is provided. Before a plurality of lots of wafers is loaded into a furnace, the characteristic variation value of each of the plurality of lots of wafers is calculated. The plurality of lots of wafers is ordered according to the size of the characteristic variation values. The plurality of lots of wafers is placed in the furnace in a descending order of the characteristic variation values corresponding to a plurality of locations in the furnace causing the characteristic variation values to change from smaller to larger.


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