The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2017

Filed:

Mar. 26, 2014
Applicant:

Nitto Denko Corporation, Ibaraki-shi, Osaka, JP;

Inventors:

Satoru Furuyama, Osaka, JP;

Yozo Nagai, Osaka, JP;

Junichi Moriyama, Osaka, JP;

Yosuke Yuri, Gunma, JP;

Takahiro Yuyama, Gunma, JP;

Tomohisa Ishizaka, Gunma, JP;

Ikuo Ishibori, Gunma, JP;

Ken-ichi Yoshida, Gunma, JP;

Yasunari Maekawa, Gunma, JP;

Hiroshi Koshikawa, Gunma, JP;

Tetsuya Yamaki, Gunma, JP;

Masaharu Asano, Gunma, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 5/18 (2006.01); B31D 3/00 (2017.01); B23K 26/04 (2014.01); B44C 1/22 (2006.01); C08J 7/12 (2006.01);
U.S. Cl.
CPC ...
C08J 5/18 (2013.01); C08J 7/123 (2013.01); C08J 2300/00 (2013.01);
Abstract

The method of the present disclosure is a method for producing a porous polymer film including: irradiating a strip-shaped polymer film with an ion beam while moving the polymer film transversely to the ion beam, so as to form a polymer film that has collided with ions in the beam; and chemically etching the formed polymer film so as to form openings and/or through holes corresponding to tracks left by the colliding ions in the polymer film. The ion beam () with which the polymer film is irradiated is obtained by folding a tail of an original beam () inwardly toward a center of the original beam by nonlinear focusing. The original beam is composed of ions accelerated in a cyclotron and has a cross-sectional intensity distribution profile in which an intensity is maximum at the center of the original beam and continuously decreases from the center toward the tail of the original beam, and the profile is an intensity distribution profile in a cross section perpendicular to a direction of the original beam.


Find Patent Forward Citations

Loading…