The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
Sep. 14, 2012
Timothy a Mccollum, Avon Lake, OH (US);
Fumitomo Hide, San Jose, CA (US);
Ian Hardcastle, Santa Cruz, CA (US);
Timothy A McCollum, Avon Lake, OH (US);
Fumitomo Hide, San Jose, CA (US);
Ian Hardcastle, Santa Cruz, CA (US);
Rambus Delaware LLC, Brecksville, OH (US);
Abstract
Optical elements with small increments in average density are formed in a substrate by laser micromachining using a variable aperture and a pattern mask set of pattern masks each having of shape-defining elements whose density differs among the pattern masks in first density increments. A laser light beam passes through a combined mask formed by the variable aperture and one pattern mask selected from the pattern mask set. The variable aperture controls beam size and the pattern mask spatially modulates its intensity. A focusing element focuses light from the combined mask on a small averaging region of the substrate. Different combinations of the size of the aperture mask and the selected pattern mask are used in combination at respective averaging regions of the substrate. The resulting average densities of the optical elements vary among the averaging regions in increments that are small compared to the first density increments.