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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9704951 B1

PDFFull Text
Date of Patent:
Jul. 11, 2017

Filed:

Nov. 14, 2014

Apparatus and method for magnetic-field guided metal-assisted chemical etching

Applicant:

The Board of Trustees of the University of Illinois, Urbana, IL (US);

Inventors:

Xiuling Li, Champaign, IL (US);

Weidong Zhou, Southlake, TX (US);

Wen Huang, Champaign, IL (US);

Assignees:

The Board of Trustees of the University of Illinois, Urbana, IL (US);

Board of Regents, The University of Texas System, Austin, TX (US);

Attorney:

Brinks Gilson & Lione

Primary Examiner:

Nadine Norton

Assistant Examiner:

Christopher Remavege

Int. Cl.
CPC ...
C03C 15/00 (2006.01); H01L 21/461 (2006.01); H01L 29/06 (2006.01); G02B 1/00 (2006.01); H01L 21/306 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0665 (2013.01); G02B 1/00 (2013.01); H01L 21/30604 (2013.01); H01L 21/67086 (2013.01);
Abstract

A magnetic field-guided method of metal-assisted chemical etching comprises immersing a structure that comprises a two-dimensional magnetic pattern layer on a surface thereof in an etchant solution. The magnetic pattern layer sinks into the structure as portions of the structure directly under the magnetic pattern layer are etched. A programmable magnetic field H(t) is applied to the structure during etching to guide the sinking of the magnetic pattern layer, thereby controlling the etching of the structure in three dimensions.

Find Patent Forward Citations

Li, Xiuling. (2017). Apparatus and method for magnetic-field guided metal-assisted chemical etching (U.S. Patent No. 9704951). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9704951

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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