The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2017

Filed:

Jan. 22, 2016
Applicant:

Samsung Display Co., Ltd., Yongin-si, Gyeonggi-Do, KR;

Inventors:

Duk-Sung Kim, Asan-si, KR;

Shin Il Choi, Hwaseong-si, KR;

Su Bin Bae, Gyeongsan-si, KR;

Yu-Gwang Jeong, Anyang-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Yongin-si, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); G02F 1/1362 (2006.01); G02F 1/1335 (2006.01); G02F 1/1333 (2006.01); G02F 1/1343 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1259 (2013.01); G02F 1/1333 (2013.01); G02F 1/133345 (2013.01); G02F 1/133516 (2013.01); G02F 1/134309 (2013.01); G02F 1/136227 (2013.01); G02F 1/136286 (2013.01); H01L 27/124 (2013.01); H01L 27/1237 (2013.01); H01L 27/1248 (2013.01); H01L 27/1262 (2013.01); G02F 2001/134372 (2013.01); G02F 2001/136222 (2013.01);
Abstract

A manufacturing method includes forming a gate member and a common electrode line on a substrate. A gate insulating layer is formed on the gate member and the common electrode line. A semiconductor member and a data member are formed on the gate insulating layer. A first passivation layer is formed on the semiconductor member and the data member. A plurality of color filters is formed on the first passivation layer. A conductor layer and a second passivation layer are formed on the plurality of color filters. A first contact hole exposes a common electrode. A second contact hole exposes the drain electrode. The first and second contact holes are formed by a photolithography process. A pixel electrode connected to the drain electrode is formed through the first contact hole. A connecting member connected to the common electrode line and the common electrode is formed through the second contact hole.


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