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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9703196 B1

PDFFull Text
Date of Patent:
Jul. 11, 2017

Filed:

Aug. 31, 2016

Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same

Applicant:

Fujifilm Corporation, Minato-Ku, Tokyo, JP;

Inventors:

Hiromi Kobayashi, Shizuoka, JP;

Haruki Inabe, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); H01L 21/027 (2006.01); C07C 69/54 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C07C 69/54 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0395 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); H01L 21/0274 (2013.01); Y10S 430/106 (2013.01); Y10S 430/114 (2013.01); Y10S 430/146 (2013.01);
Abstract

A method for producing a resist composition includes at least a step of filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms into (D) a solvent, through a filter.

Find Patent Forward Citations

Kobayashi, Hiromi. (2017). Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same (U.S. Patent No. 9703196). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9703196

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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