The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2017
Filed:
Apr. 27, 2016
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03F 7/11 (2006.01); C07D 305/06 (2006.01); C07D 305/08 (2006.01); C07D 307/20 (2006.01); C07D 307/33 (2006.01); C07D 309/10 (2006.01); C07D 307/93 (2006.01); C07D 303/16 (2006.01); C07D 493/08 (2006.01); C07D 493/18 (2006.01); C07D 333/46 (2006.01); C07C 321/28 (2006.01); C07C 307/02 (2006.01); C07J 41/00 (2006.01); C07J 31/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 307/02 (2013.01); C07C 321/28 (2013.01); C07D 303/16 (2013.01); C07D 305/06 (2013.01); C07D 305/08 (2013.01); C07D 307/20 (2013.01); C07D 307/33 (2013.01); C07D 307/93 (2013.01); C07D 309/10 (2013.01); C07D 333/46 (2013.01); C07D 493/08 (2013.01); C07D 493/18 (2013.01); C07J 41/0055 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01); C07C 2101/02 (2013.01); C07C 2101/04 (2013.01); C07C 2101/08 (2013.01); C07C 2101/14 (2013.01); C07C 2102/42 (2013.01); C07C 2103/68 (2013.01); C07C 2103/74 (2013.01); C07C 2103/86 (2013.01); C07J 31/006 (2013.01);
Abstract
An onium salt having an anion moiety of a specific structure is an effective photoacid generator. A resist composition comprising the onium salt has the advantages of compatibility and reduced acid diffusion and forms a pattern with a good balance of sensitivity and MEF, rectangularity, and minimal defects.