The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2017
Filed:
Oct. 23, 2015
Applicant:
Gentex Corporation, Zeeland, MI (US);
Inventors:
Henry A. Luten, Holland, MI (US);
Donald L. Bareman, Zeeland, MI (US);
Thomas J. Scott, Belmont, MI (US);
Kurtis L. Geerlings, Zeeland, MI (US);
William L. Tonar, Holland, MI (US);
Niels A. Olesen, Zeeland, MI (US);
Assignee:
GENTEX CORPORATION, Zeeland, MI (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 7/00 (2006.01); G02F 1/153 (2006.01); B23K 26/362 (2014.01); B23K 26/04 (2014.01);
U.S. Cl.
CPC ...
G02F 1/1533 (2013.01); B23K 26/048 (2013.01); B23K 26/362 (2013.01);
Abstract
A method is provided for laser ablation that reduces or eliminates a diffraction effect produced by damage to a surface from which an ablated material is removed. The method includes at least one of reducing the amount of surface damage produced and altering the damage structure produced such that it is irregular.