The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2017
Filed:
Apr. 07, 2015
Applicant:
Futurewei Technologies, Inc., Plano, TX (US);
Inventors:
Huapu Pan, San Jose, CA (US);
Zongrong Liu, Pleasanton, CA (US);
Hongzhen Wei, Pleasanton, CA (US);
Hongmin Chen, Davis, CA (US);
Assignee:
Futurewei Technologies, Inc., Plano, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/12 (2006.01); G02B 6/136 (2006.01); G02B 6/132 (2006.01); G02B 6/30 (2006.01); G02B 6/122 (2006.01);
U.S. Cl.
CPC ...
G02B 6/136 (2013.01); G02B 6/1223 (2013.01); G02B 6/132 (2013.01); G02B 6/305 (2013.01); G02B 2006/12061 (2013.01); G02B 2006/12097 (2013.01); G02B 2006/12195 (2013.01);
Abstract
A method of fabricating an edge coupling device and an edge coupling device are provided. The method includes removing a portion of cladding material to form a trench over an inversely tapered silicon waveguide, depositing a material having a refractive index greater than silicon dioxide over remaining portions of the cladding material and in the trench, and removing a portion of the material within the trench to form a ridge waveguide.