The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2017

Filed:

Mar. 01, 2011
Applicants:

Wei Chen, Pudong, CN;

Honghai Dong, Pudong, CN;

Zhaohui Yang, Pudong, CN;

Minggang She, Pudong, CN;

Lishun HU, Pudong, CN;

KE Liu, Irvine, CA (US);

Xianglong Zhao, Pudong, CN;

Inventors:

Wei Chen, Pudong, CN;

Honghai Dong, Pudong, CN;

Zhaohui Yang, Pudong, CN;

Minggang She, Pudong, CN;

Lishun Hu, Pudong, CN;

Ke Liu, Irvine, CA (US);

Xianglong Zhao, Pudong, CN;

Assignee:

GENERAL ELECTRIC COMPANY, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01J 7/00 (2006.01); F27D 1/00 (2006.01); C10J 3/48 (2006.01); C10J 3/74 (2006.01); C10J 3/52 (2006.01); C10J 3/76 (2006.01); C10J 3/84 (2006.01);
U.S. Cl.
CPC ...
F27D 1/0006 (2013.01); C10J 3/485 (2013.01); C10J 3/526 (2013.01); C10J 3/74 (2013.01); C10J 3/76 (2013.01); C10J 3/845 (2013.01); C10J 2300/093 (2013.01); C10J 2300/0959 (2013.01);
Abstract

A refractory wall comprises a hotface layer comprising a hotface surface configured to be adjacent to a carbonaceous gasification environment, a backing layer facing the hotface layer, and a cooling layer facing the backing layer and configured to cool the hotface layer via the backing layer. A gasification device and a gasification process are also presented.


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