The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2017

Filed:

Dec. 07, 2015
Applicant:

Ppg Industries Ohio, Inc., Cleveland, OH (US);

Inventors:

Songwei Lu, Wexford, PA (US);

Thomas G. Rukavina;

Mehran Arbab, Wexford, PA (US);

Assignee:

PPG Industries Ohio, Inc., Cleveland, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K 3/22 (2006.01); C08L 31/00 (2006.01); B82Y 30/00 (2011.01); C08L 69/00 (2006.01); C08J 3/205 (2006.01);
U.S. Cl.
CPC ...
C08K 3/22 (2013.01); B82Y 30/00 (2013.01); C08J 3/205 (2013.01); C08K 3/2279 (2013.01); C08L 31/00 (2013.01); C08L 69/00 (2013.01); C08K 2003/2227 (2013.01); C08K 2003/2231 (2013.01); C08K 2003/2241 (2013.01); C08K 2003/2244 (2013.01);
Abstract

The present invention is directed toward a polymer and a method for making a polymer that has nanostructures incorporated into the matrix of the polymer. The method of the invention involves the following steps: mixing a precursor solution for the polymer with a precursor for the nanostructures to form a mixture; forming nanostructures in the mixture from the precursor of the nanostructures; and forming a polymer from the precursor solution of the polymer so that the nanostructures are incorporated into the polymer matrix.


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